Advanced Technologies Based on Wave and Beam Generated Plasmas
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Beschreibung
Preface.Part 1: Lectures. 1.1. Gas Discharges: Applications. Plasma Discharges for Materials Processing and Display Applications; M.A. Lieberman. The Development and Use of Surface - Wave Sustained Discharges for Applications; M. Moisan, et al. Electrodeless Gas Discharges for Lighting; G.G. Lister. Plasma Production above Multipolar Magnetic Field Structures: from D.C. Magnetrons to Distributed ECR; J. Pelletier, et al. ECR Plasmas for Thin-Film Deposition; R. Wilhelm. Deposition Properties and Applications of Carbon-Based Coatings; R. Wilhelm. Substrate Biasing during Plasma Processing: Interest, Methods and Limitations; J. Pelletier. Ion Energy Distributions; G.W.M. Kroesen, et al. Dusty Plasmas: Fundamental Aspects and Industrial Applications; G.W.M. Kroesen, et al. 1.2. Ion Implantation. Plasma Based Ion Implantation; W. Möller. 1.3. Wave Generated Plasmas. Waveguide Stationary and Nonstationary Discharges: Modelling and Experiments; D. Grozev, et al. Nonuniformity Aspects in Modelling and Noncollisional Heating of HF Discharges; H. Schlüter. Travelling Wave Discharges in Nitrogen: Modelling and Experiment; C.M. Ferreira, et al. Atmospheric Pressure Discharges: Travelling Wave Plasma Sources; Z. Zakrzewski, M. Moisan. Modelling of Atmospheric Pressure Microwave Sustained Discharges; Z. Zakrzewski, et al. Long Microwave Discharges; Z. Zakrzewski, M. Moisan. Waves in Bounded Magnetized Plasmas; S.T. Ivanov. 1.4. Beam Generated Plasmas. Electron Beam Generated Plasmas: Theory Experiments, Applications; M.V. Kuzelev. EBIT: An Electron Beam Source for the Production and Confinement of Highly Ionized Atoms; G.Fußmann, et al. Part 2: Posters. Author Index. Subject Index.
Eigenschaften
Breite: | 160 |
Gewicht: | 998 g |
Höhe: | 240 |
Seiten: | 569 |
Sprachen: | Englisch |
Autor: | A. Shivarova, H. Schlüter |
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